A Tungsten Carbide (WC) Sputtering Target is a high-quality material used in physical vapor deposition (PVD) processes. It is made of a mixture of tungsten and carbon atoms, typically in a 1:1 ratio, which forms a hard and wear-resistant compound with a high melting point.

The WC sputtering target is widely used in various industrial applications, including the deposition of wear-resistant coatings on cutting tools, molds, and other mechanical components. It is also used in the production of microelectronics, optics, and decorative coatings.

The tungsten carbide sputtering target is available in different sizes and shapes, including planar, rotary, and custom shapes. It is manufactured using advanced powder metallurgy techniques to ensure high density, uniformity, and purity.