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Thulium Oxide (Tm2O3) Sputtering Target
Thulium Oxide (Tm2O3) Sputtering Target
CG provides high-quality Thulium Oxide Sputtering Target for research and industry purposes at competitive prices. We can provide Cerium Sputtering Target with different purity, size, and density according to your requirements.
Descriptions
Thulium Oxide (Tm2O3) Sputtering Target is a high-purity ceramic target used in thin film deposition processes for the fabrication of various electronic and optical devices. It is made of thulium oxide, a rare earth oxide with the chemical formula Tm2O3.
Thulium Oxide Sputtering Target has a high melting point, good thermal stability, and high hardness, making it suitable for use in a wide range of sputtering applications. It is commonly used in the manufacture of thin-film optical coatings, including antireflection coatings, mirror coatings, and laser coatings.