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Terbium Sputtering Target

Terbium Sputtering Target


  • Symbol: Tb
  • Purity: 99% - 99.99%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Color: Silver white
  • Shape: Circular, rectangular, annular, rotary etc.

    CG provides high-quality Cerium Sputtering Target for research and industry purposes at competitive prices. We can provide Cerium Sputtering Target with different purity, size, and density according to your requirements.


    Terbium sputtering targets are used for thin film deposition in various applications such as magnetic storage media, optical coatings, and semiconductor devices. The targets are typically made of high-purity terbium metal or terbium oxide powder that has been consolidated into a solid form through a process such as hot pressing or cold isostatic pressing. The resulting target is then machined to the desired shape and size for use in sputtering equipment. Terbium sputtering targets can be used in both DC and RF sputtering systems and are available in various sizes and configurations depending on the specific application requirements.


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