Praseodymium Oxide (Pr6O11) Sputtering Target

CG provides high-quality Praseodymium Oxide Sputtering Target for research and industry purposes at competitive prices. We can provide Cerium Sputtering Target with different purity, size, and density according to your requirements.

Description

Praseodymium oxide (Pr6O11) sputtering target is a high-purity material used in thin film deposition applications. It is commonly used in the production of microelectronic devices, magnetic storage media, and other advanced technologies. The sputtering process involves bombarding the target material with ions to dislodge atoms, which then deposit onto a substrate to form a thin film. Praseodymium oxide sputtering targets are made from high-purity Pr6O11 powders, which are pressed and sintered into a dense target with a uniform composition and microstructure. The targets are available in various sizes and shapes to suit different deposition equipment and process requirements.