CG provides high-quality Dysprosium Sputtering Target for research and industry purposes at competitive prices. We can provide Cerium Sputtering Target with different purity, size, and density according to your requirements.

Application

Dysprosium sputtering targets are used in the deposition of thin films for a variety of applications, including magnetic data storage, semiconductor devices, and optical coatings. These targets are typically made of high-purity dysprosium metal or dysprosium oxide powder that has been consolidated into a solid form through a process such as hot pressing or cold isostatic pressing. The resulting target is then machined to the desired shape and size for use in sputtering equipment. Dysprosium sputtering targets can be used in both DC and RF sputtering systems and are available in various sizes and configurations depending on the specific application requirements.