Dysprosium Oxide (Dy2O3) Sputtering Target

CG provides high-quality Dysprosium Oxide Sputtering Target for research and industry purposes at competitive prices. We can provide Cerium Sputtering Target with different purity, size, and density according to your requirements.

Application

Dysprosium Oxide (Dy2O3) sputtering target is a high purity ceramic target used for physical vapor deposition (PVD) processes to deposit thin films of dysprosium oxide on various substrates. Dysprosium oxide sputtering targets are commonly used in the production of magnetic materials, data storage, magneto-optical recording, and in the fabrication of semiconductors, optical coatings, and thin film batteries.