Thulium Sputtering Target

 CG provides high-quality Cerium Sputtering Target for research and industry purposes at competitive prices. We can provide Cerium Sputtering Target with different purity, size, and density according to your requirements.

Description

Thulium sputtering targets are typically made from high-purity thulium metal and are used in various applications such as thin film deposition, semiconductor manufacturing, and research. The targets are usually made in the form of disks or rectangles and have a high density and uniform grain structure to ensure optimal performance during the sputtering process. The purity of thulium sputtering targets can vary depending on the specific application, but they typically have a purity of 99.9% or higher. Thulium sputtering targets can be customized in terms of shape, size, and purity to meet the specific requirements of different applications.