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CG MATERIAL

Micro Tantalum Powder

Micro Tantalum Powder

Micro Tantalum Powder is a finely divided powder made from tantalum metal. It is used in a variety of applications, such as powder metallurgy, capacitors, and electronics. The powder is produced through a process of chemical reduction or electrolysis, and it is characterized by its high purity, high density, and good mechanical properties. It is also highly resistant to corrosion, making it an ideal material for use in harsh environments.

Tantalum Powder Properties (Theoretical)

Molecular Weight 180.94
Appearance Silvery-gray solid
Melting Point 3017 °C
Boiling Point 5458 °C
Density 16.69 g/cm3 (20 °C)
Solubility in H2O N/A
Crystal Phase / Structure α: body-centered cubic (bcc) / β: tetragonal
Electrical Resistivity 131 nΩ·m (20 °C)
Electronegativity 1.5 Paulings
Heat of Fusion 36.57 kJ/mol
Heat of Vaporization 753 kJ/mol
Poisson's Ratio 0.34
Specific Heat 140 J/kg·K
Thermal Conductivity 57.5 W/m·K
Thermal Expansion 6.3 µm/m·K
Vickers Hardness 870–1200 MPa
Young's Modulus 186 GPa

 

Particle Size -325 mesh, -200 mesh, customized
Purity 99.9%, 99.99%
CAS 7440-25-7


Tantalum Powder Types

Item No.

Description

Purity

Lot Size

CG-TAP01

Tantalum Metal Powder 
Metallurgical Grade 
-150 mesh or -325 mesh.

Ta > 99.95% (metals basis) 
Nb < 0.010%, Fe < 0.005%, Ni < 0.005%, Si < 0.015% 
O < 0.2%, H < 0.005%, N < 0.01%, C < 0.015%

10 kg 
50 kg 
100 kg

CG-TAP02

Tantalum Metal Powder 
Electron Beam Grade 
-150 mesh or -325 mesh.

Ta > 99.95% (metals basis) 
Nb < 50 ppm, Fe < 25 ppm, Ni < 50 ppm, Si < 10 ppm 
O < 2000 ppm, N < 50 ppm, C < 50 ppm

10 kg 
50 kg 
100 kg

CG-TAP03

Tantalum Metal Powder 
Various Capacitor Grades 
Ask for detailed specs.

Ta > 99.95% (metals basis) 
O 1600~2800 ppm, N 70~300 ppm, C 70~100 ppm 
Nb < 50 ppm, Fe+Cr+Ni < 150 ppm, Si < 10 ppm 
Specific capacitance: 3,500 to 40,000 µfv/g

10 kg 
50 kg 
100 kg

CG Material offers broad selections of bulk density, particle size range, and purity. The purity includes commercially pure, 3N (99.9%), 3N5 (99.95%), 4N (99.99%).

  • Tantalum Powder Inventory
    Tantalum Powder, 99.95%, -325 mesh
    Tantalum Powder, 99.95%, -200 mesh
    Fine particle size tantalum powder, 99.95%, D(50): <3μm, D(90): <10μm
    Low oxygen tantalum metal Powder, 99.95%, O<1000 ppm
    Spherical Tantalum (Ta) Powder
    Spherical Tantalum Tungsten Alloy (Ta2.5W, Ta0W) Powder

*Special particle sizes can be customized upon your request.

Tantalum Powder Applications

Tantalum metal powder can be used in sputtering targets, alloys, thermal and chemical resistant coating, 3D printing (additive manufacturing), and electrolytic capacitors. There are four types of powders:

  •  Nodular powder from the chemical reduction of tantalum salt or oxide. The resulting powder is aggregated consisting of primary particles and pores. It has a relatively low density and high surface area.
  • EB powder from hydride and de-hydride of electron bean or arc melted ingot. The particle of this powder is typically angular and non-aggregated.
  • Capacitor Grades powder can be used to manufacture high-performance chip or dipping-type tantalum electrolyte capacitors.
  • Spherical powder from plasma inert gas atomization. This generates a spherical shape with a smooth surface that has excellent flow characteristics. The powder is particularly suitable for 3D printing. 

Packaging

We handle our products with care to ensure they remain in their original condition during storage and transportation and to preserve their quality.

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