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CG MATERIAL

Electrostatic Chuck (Al2O3, AlN, Sapphire)

Electrostatic Chuck (Al2O3, AlN, Sapphire)

An electrostatic chuck (ESC) is a device used to hold a substrate in place during various processes, such as semiconductor manufacturing. The ESC is made of a ceramic material, such as alumina (Al2O3), aluminum nitride (AlN), or sapphire, and is designed to hold the substrate through electrostatic attraction.

Alumina, AlN, and sapphire are popular materials for ESCs due to their excellent mechanical, thermal, and electrical properties. Alumina, in particular, is a popular choice for ESCs due to its high dielectric strength and low electrical conductivity. It can withstand high temperatures and is resistant to chemical attack, making it suitable for use in harsh environments.

The ESC consists of a ceramic plate with an embedded electrode that is connected to a power supply. When a voltage is applied to the electrode, an electric field is created that attracts the substrate to the plate. The electrostatic attraction is strong enough to hold the substrate in place during processing, but weak enough to allow for easy release of the substrate when the voltage is turned off.

ESCs are commonly used in semiconductor manufacturing for processes such as etching, deposition, and ion implantation. They are also used in other industries, such as flat-panel display manufacturing and data storage, where precise positioning and control of substrates are critical.

 

Catalog No. CERAMICS
Size Customized
Material Al2O3
Purity 95% 99% 99.7%
Density 3.8~3.9 g/cm3

 

At CG Material, we offer high quality Electrostatic Chuck (Al2O3, AlN, Sapphire) with exceptional purity and precision in terms of size. Our products range in diameter from 1mm to 100mm and have a purity level of up to 99.8%. We also provide custom manufacturing options for special shapes to meet specific needs.

Electrostatic Chuck Specifications

– Designed for φ200/300mm Equipment

– High-purity Al2O3/AlN/Sapphire material

– High plasma durability

– Good chucking/de-chucking response

– Withstand the extreme natural condition of some samples in both high and low temperature

Material Item Sapphire
Color Transparent
Content (%) 99.99
Density (g/cm3) 3.97
Vickers Hardness HV9.807N (Gpa) 22.5
Young's Modulus (Gpa) 470
Compressive Strength (Mpa) 2,940
Thermal Conductivity (20℃) (W/(m·K) 41


Electrostatic Chuck Applications

Electrostatic Chuck is used for silicon wafer installation, flatness correction, and silicon wafer cooling.

Packaging

We handle our products with care to ensure they remain in their original condition during storage and transportation and to preserve their quality.

 

 

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